Invention Grant
- Patent Title: Semiconductor film
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Application No.: US17588708Application Date: 2022-01-31
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Publication No.: US12159907B2Publication Date: 2024-12-03
- Inventor: Hiroshi Fukui , Morimichi Watanabe , Jun Yoshikawa
- Applicant: NGK INSULATORS, LTD.
- Applicant Address: JP Nagoya
- Assignee: NGK INSULATORS, LTD.
- Current Assignee: NGK INSULATORS, LTD.
- Current Assignee Address: JP Nagoya
- Agency: BURR PATENT LAW, PLLC
- Main IPC: H01L29/24
- IPC: H01L29/24 ; H01L29/06

Abstract:
Provided is a α-Ga2O3 based semiconductor film which is a semiconductor film in a circular shape having a crystal having a corundum-type crystal structure composed of α-Ga2O3 or an α-Ga2O3 solid solution as a main phase. The maximum value θmax and the minimum value θmin for off-angles at the center point X and four outer circumferential points A, B, C, and D of a surface of the semiconductor film satisfy the relationship of θmax-θmin≤0.30°. The off-angle is defined as an inclination angle θ of a crystal axis oriented in the substantially normal direction of the semiconductor film with respect to the film surface normal of the semiconductor film.
Public/Granted literature
- US20220157946A1 SEMICONDUCTOR FILM Public/Granted day:2022-05-19
Information query
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