Invention Grant
- Patent Title: Method for high resolution image inpainting, processing system and associated computer program product
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Application No.: US17623330Application Date: 2020-03-24
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Publication No.: US12165294B2Publication Date: 2024-12-10
- Inventor: Michal Kudelski , Tomasz Latkowski , Filip Skurniak , Lukasz Sienkiewicz , Piotr Frankowski , Bartosz Biskupski
- Applicant: TCL RESEARCH EUROPE SP. Z O. O.
- Applicant Address: PL Warsaw
- Assignee: TCL RESEARCH EUROPE SP. Z O. O.
- Current Assignee: TCL RESEARCH EUROPE SP. Z O. O.
- Current Assignee Address: PL Warsaw
- Agency: ANOVA LAW GROUP, PLLC
- International Application: PCT/PL2020/050023 WO 20200324
- International Announcement: WO2021/194361 WO 20210930
- Main IPC: G06T5/77
- IPC: G06T5/77 ; G06T3/40 ; G06T3/60

Abstract:
A computer-implemented method for high resolution image inpainting comprising the following steps: providing a high resolution input image, providing at least one inpainting mask, selecting at least one rectangular sub-region of the input image and at least one aligned rectangular subregion of the inpainting mask such that the rectangular subregion of the input image encompasses at least one set of pixels to be removed and synthetized, the at least one sub-region of the input image and its corresponding aligned subregion of the inpainting mask having identical minimum possible size and a position for which a calculated information gain does not decrease, processing the sub-region of the input image and its corresponding aligned subregion of the inpainting mask by a machine learning model, generating an output high resolution image comprising the inpainted sub-region.
Public/Granted literature
- US20220366544A1 METHOD FOR HIGH RESOLUTION IMAGE INPAINTING, PROCESSING SYSTEM AND ASSOCIATED COMPUTER PROGRAM PRODUCT Public/Granted day:2022-11-17
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