Invention Grant
- Patent Title: Ion beam delayering system and method, topographically enhanced delayered sample produced thereby, and imaging methods and systems related thereto
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Application No.: US17309372Application Date: 2019-11-20
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Publication No.: US12165840B2Publication Date: 2024-12-10
- Inventor: Christopher Pawlowicz , Alexander Sorkin
- Applicant: TechInsights Inc.
- Applicant Address: CA Ottawa
- Assignee: TechInsights Inc.
- Current Assignee: TechInsights Inc.
- Current Assignee Address: CA Ottawa
- Agency: Knobbe, Martens, Olson & Bear, LLP
- International Application: PCT/CA2019/051661 WO 20191120
- International Announcement: WO2020/102899 WO 20200528
- Main IPC: H01J37/304
- IPC: H01J37/304 ; G01N1/28 ; G01N1/32 ; G01N23/2251 ; G01R31/28 ; H01J37/31

Abstract:
Described are various embodiments of an ion beam delayering system and method, topographically enhanced sample produced thereby, and imaging methods and systems related thereto. In one embodiment, a method comprises: identifying at least two materials in an exposed surface of the sample and predetermined operational characteristics of an ion beam mill that correspond with a substantially different ion beam mill removal rate for at least one of the materials; operating the ion beam mill in accordance with the predetermined operational characteristics to simultaneously remove the materials and introduce or enhance a topography associated with the materials and surface features defined thereby; acquiring surface data; and repeating the operating and acquiring steps for at least one more layer.
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