Invention Grant
- Patent Title: Semiconductor device and fabrication method thereof
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Application No.: US17427923Application Date: 2021-02-25
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Publication No.: US12166116B2Publication Date: 2024-12-10
- Inventor: Hao Li , King Yuen Wong , Weigang Yao
- Applicant: INNOSCIENCE (SUZHOU) TECHNOLOGY CO., LTD.
- Applicant Address: CN Suzhou
- Assignee: INNOSCIENCE (SUZHOU) TECHNOLOGY CO., LTD.
- Current Assignee: INNOSCIENCE (SUZHOU) TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Suzhou
- Agency: JCIPRNET
- International Application: PCT/CN2021/077853 WO 20210225
- International Announcement: WO2022/178750 WO 20220901
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/20 ; H01L29/417 ; H01L29/423

Abstract:
A semiconductor device includes a drain electrode, a first source electrode, a second source electrode, a first gate electrode, and a second gate electrode. The first gate electrode is arranged between the first source electrode and the drain electrode. The first gate electrode extends along a first direction. The second gate electrode is arranged between the second source electrode and the drain electrode. The second gate electrode extends along the first direction. The first gate electrode is arranged above a first imaginary line substantially perpendicular to the first direction in a top view of the semiconductor device and the second gate electrode is arranged below a second imaginary line substantially perpendicular to the first direction in the top view of the semiconductor device.
Public/Granted literature
- US20220376101A1 SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF Public/Granted day:2022-11-24
Information query
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