Invention Grant
- Patent Title: Apparatus for processing substrate
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Application No.: US17042091Application Date: 2019-03-27
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Publication No.: US12170221B2Publication Date: 2024-12-17
- Inventor: Won Woo Jung , Young-Rok Kim , Yoo Seong Kim , Jong Sik Kim , Chul Joo Hwang
- Applicant: JUSUNG ENGINEERING CO., LTD.
- Applicant Address: KR Gwangju-si
- Assignee: JUSUNG ENGINEERING CO., LTD.
- Current Assignee: JUSUNG ENGINEERING CO., LTD.
- Current Assignee Address: KR Gwangju-si
- Agency: Renaissance IP Law Group LLP
- Priority: KR10-2018-0038594 20180403,KR10-2018-0164262 20181218
- International Application: PCT/KR2019/003573 WO 20190327
- International Announcement: WO2019/194459 WO 20191010
- Main IPC: H01L21/687
- IPC: H01L21/687 ; C23C16/458

Abstract:
The present inventive concept relates to a substrate processing apparatus including a supporting part for supporting a substrate; a disk supporting a plurality of the supporting parts; a lid disposed on the disk; and a first protrusion portion coupled to the disk to protrude in an upward direction from the disk to the lid in a center region disposed inward from the supporting parts and a gap region disposed between the supporting parts.
Public/Granted literature
- US20210193501A1 APPARATUS FOR PROCESSING SUBSTRATE Public/Granted day:2021-06-24
Information query
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