Invention Grant
- Patent Title: Semiconductor storage device and method of manufacturing semiconductor storage device
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Application No.: US18403916Application Date: 2024-01-04
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Publication No.: US12178047B2Publication Date: 2024-12-24
- Inventor: Gen Kuribayashi , Shigeki Kobayashi
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JP2021-151000 20210916
- Main IPC: H10B43/27
- IPC: H10B43/27 ; G11C16/04 ; H10B41/10 ; H10B41/27 ; H10B41/35 ; H10B43/10 ; H10B43/35

Abstract:
A semiconductor storage includes a stack, columns, and first, second, third, fourth, and fifth insulators. The stack includes first conductive layers, and second and third conductive layers below and above the first conductive layers, respectively. The columns penetrate the stack in a first direction. The first and second insulators penetrate the stack and are separated from each other in a second direction. The third insulator is between the first and second insulators in a third direction. The third insulator includes first and second portions apart from each other in the second direction. The fourth insulator is between the first and second portions. The fifth insulator is between the first and second portions above the fourth insulator. The second conductive layer includes two electrically-separated regions, between which the third and fourth insulators are provided. The third conductive layer includes two electrically-separated regions between which the third and fifth insulators are provided.
Public/Granted literature
- US20240147724A1 SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2024-05-02
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