Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17645996Application Date: 2021-12-26
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Publication No.: US12183789B2Publication Date: 2024-12-31
- Inventor: Daisuke Ozaki , Tohru Shirakawa , Yasunori Agata
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kawasaki
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kawasaki
- Priority: JP2020-006110 20200117
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/08 ; H01L29/10

Abstract:
Provided is a semiconductor device which includes a semiconductor substrate including a transistor portion and a diode portion. The transistor portion includes an injection suppression region that suppresses injection of a carrier of a second conductivity type at an end portion on the diode portion side in a top view of the semiconductor substrate. The diode portion includes a lifetime control region including a lifetime killer. Both the transistor portion and the diode portion include a base region of a second conductivity type on a surface of the semiconductor substrate, the transistor portion further includes an emitter region of a first conductivity type and an extraction region of a second conductivity type having a higher doping concentration than the base region on the surface of the semiconductor substrate, and the injection suppression region is not provided with the emitter region and the extraction region.
Public/Granted literature
- US20220123108A1 SEMICONDUCTOR DEVICE Public/Granted day:2022-04-21
Information query
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