Invention Grant
- Patent Title: Variable graduated capacitor structure and methods for forming the same
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Application No.: US17318285Application Date: 2021-05-12
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Publication No.: US12191247B2Publication Date: 2025-01-07
- Inventor: Jheng-Hong Jiang , Shing-Huang Wu , Chia-Wei Liu
- Applicant: Taiwan Semiconductor Manufacturing Company Limited
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee Address: TW Hsinchu
- Agency: The Marbury Law Group, PLLC
- Main IPC: H01L23/522
- IPC: H01L23/522 ; H01L21/66 ; H01L21/768 ; H01L49/02

Abstract:
Devices and methods of manufacture for a graduated, “step-like,” capacitance structure having two or more capacitors. A semiconductor structure comprising a capacitor structure, the capacitor structure comprising a first capacitor and a second capacitor. The first capacitor comprising a first bottom electrode and a top electrode having a bottom surface that is a first distance from a top surface of the first bottom electrode. The second capacitor comprising a second bottom electrode and the top electrode, in which the bottom surface is a second distance from a top surface of the second bottom electrode, and in which the first distance is different from the second distance.
Public/Granted literature
- US20220367340A1 VARIABLE GRADUATED CAPACITOR STRUCTURE AND METHODS FOR FORMING THE SAME Public/Granted day:2022-11-17
Information query
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