Invention Grant
- Patent Title: Laminated aerosol deposition coating for aluminum components for plasma processing chambers
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Application No.: US17432003Application Date: 2020-03-03
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Publication No.: US12198902B2Publication Date: 2025-01-14
- Inventor: Lin Xu , John Daugherty , Satish Srinivasan , David Joseph Wetzel
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Beyer Law Group LLP
- International Application: PCT/US2020/020757 WO 20200303
- International Announcement: WO2020/180853 WO 20200910
- Main IPC: B32B15/04
- IPC: B32B15/04 ; B32B17/06 ; H01J37/32 ; C23C24/04 ; H01L21/687
Abstract:
An apparatus adapted for use in a plasma processing chamber is provided. An aluminum body with at least one surface is provided. An aluminum oxide containing aerosol deposition coating is disposed over the at least one surface of the aluminum body. An yttrium containing aerosol deposition coating is disposed over the aluminum oxide containing aerosol deposition coating.
Public/Granted literature
- US20220115214A1 LAMINATED AEROSOL DEPOSITION COATING FOR ALUMINUM COMPONENTS FOR PLASMA PROCESSING CHAMBERS Public/Granted day:2022-04-14
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