Invention Grant
- Patent Title: Thin-film-deposition equipment
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Application No.: US17484611Application Date: 2021-09-24
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Publication No.: US12198904B2Publication Date: 2025-01-14
- Inventor: Jing-Cheng Lin , Yu-Te Shen
- Applicant: SKY TECH INC.
- Applicant Address: TW Hsinchu County
- Assignee: SKY TECH INC.
- Current Assignee: SKY TECH INC.
- Current Assignee Address: TW Hsinchu County
- Agency: HDLS IPR SERVICES
- Agent Chun-Ming Shib
- Priority: TW11012822 20210629
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/44 ; C23C16/455 ; C23C16/52

Abstract:
The present disclosure provides a thin-film-deposition equipment, which includes a main body, a carrier and a shielding device, wherein a portion of the shielding device and the carrier are disposed within the main body. The main body includes a reaction chamber, and two sensor areas connected to the reaction chamber, wherein the sensor areas are smaller than the reaction chamber. The shielding device includes a first-shield member, a second-shield member and a driver. The driver interconnects the first-shield member and the second-shield member, for driving the first-shield member and the second-shield member to move in opposite directions. During a deposition process, the two shield members are separate from each other into an open state, and respectively enter the two sensor areas. During a cleaning process, the driver swings the shield members toward each other into a shielding state for covering the carrier.
Public/Granted literature
- US20220415623A1 THIN-FILM-DEPOSITION EQUIPMENT Public/Granted day:2022-12-29
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