Invention Grant
- Patent Title: Method for producing element chips
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Application No.: US17550309Application Date: 2021-12-14
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Publication No.: US12205823B2Publication Date: 2025-01-21
- Inventor: Toshiyuki Takasaki , Ryota Furukawa , Atsushi Harikai , Shogo Okita
- Applicant: Panasonic Intellectual Property Management Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee: Panasonic Intellectual Property Management Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: PEARNE & GORDON LLP
- Priority: JP2020-208978 20201217
- Main IPC: H01L21/3065
- IPC: H01L21/3065 ; H01L21/311 ; H01L21/78

Abstract:
Disclosed is a method for producing element chips. The method includes: a preparing step of preparing a substrate 10 that is held on a holding sheet 22 that is supported by a frame 21, the substrate including element regions and dicing regions; a protective film forming step of forming a protective film 15 so as to cover the frame 21, the holding sheet 22, and the substrate 10; a patterning step of removing a part of the protective film 15 so as to expose the dicing regions of the substrate 10; a plasma dicing step including a process that uses a plasma that contains fluorine, the plasma dicing step being a step of individualizing the substrate 10 into a plurality of element chips; and a fluorine removing step of removing, together with the protective film 15, fluorine attached to the protective film 15 in the plasma dicing step.
Public/Granted literature
- US20220199411A1 METHOD FOR PRODUCING ELEMENT CHIPS Public/Granted day:2022-06-23
Information query
IPC分类: