Invention Grant
- Patent Title: Reflection target X-ray source with steered beam on target
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Application No.: US17967958Application Date: 2022-10-18
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Publication No.: US12213238B2Publication Date: 2025-01-28
- Inventor: Claus Flachenecker
- Applicant: Carl Zeiss X-ray Microscopy, Inc.
- Applicant Address: US CA Dublin
- Assignee: Carl Zeiss X-ray Microscopy, Inc.
- Current Assignee: Carl Zeiss X-ray Microscopy, Inc.
- Current Assignee Address: US CA Dublin
- Agency: HoustonHogle LLP
- Main IPC: H05G1/52
- IPC: H05G1/52

Abstract:
A method for controlling an x-ray source comprises generating an electron beam for striking the target to generate x-rays and steering the electron beam to a desired location on the target using a first and a second steering system distributed along a flight tube. In this way, the beam can be steering to the desired location while also passing through the center of a focusing lens to maintain optimal beam characteristics. Also possible is scanning the electron beam over the target to find a fiducial mark. Then, a desired location can be found as an offset from this mark.
Public/Granted literature
- US20240130028A1 Reflection target X-ray source with steered beam on target Public/Granted day:2024-04-18
Information query
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