Invention Grant
- Patent Title: Composition for forming polyvinylidene fluoride film
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Application No.: US17427195Application Date: 2020-01-27
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Publication No.: US12213382B2Publication Date: 2025-01-28
- Inventor: Takuma Nagahama , Shinichi Maeda
- Applicant: NISSAN CHEMICAL CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NISSAN CHEMICAL CORPORATION
- Current Assignee: NISSAN CHEMICAL CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2019-015190 20190131
- International Application: PCT/JP2020/002654 WO 20200127
- International Announcement: WO2020/158635 WO 20200806
- Main IPC: H10N30/857
- IPC: H10N30/857 ; C08F14/22 ; C08J5/18 ; C08K5/41 ; C08K5/42 ; H10N30/098
Abstract:
The present invention provides a composition for forming a polyvinylidene fluoride film, which contains: a polyvinylidene fluoride; at least one surfactant that is selected from among sulfuric acid-based surfactants, sulfonic acid-based surfactants and quaternary ammonium salt type surfactants; and a solvent.
Public/Granted literature
- US20220158077A1 COMPOSITION FOR FORMING POLYVINYLIDENE FLUORIDE FILM Public/Granted day:2022-05-19
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