Invention Grant
- Patent Title: Memory device and method for manufacturing the same
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Application No.: US17431660Application Date: 2020-07-22
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Publication No.: US12219784B2Publication Date: 2025-02-04
- Inventor: Lorenzo Fratin , Paolo Fantini , Fabio Pellizzer
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Holland & Hart LLP
- International Application: PCT/IB2020/020041 WO 20200722
- International Announcement: WO2022/018476 WO 20220127
- Main IPC: H10B63/00
- IPC: H10B63/00 ; H10N70/00 ; H10N70/20

Abstract:
Methods for, apparatuses with and vertical 3D memory devices are described. A vertical 3D memory device may comprise: a plurality of contacts associated with a plurality of digit lines and extending through a substrate; a plurality of word line plates separated from one another by respective dielectric layers and including a first plurality of word line plates and a second plurality of word line plates; a first dielectric material positioned between the first plurality and the second plurality of word line plates, the first dielectric material extending in a serpentine shape over the substrate; a conformal material positioned between the first dielectric material and the first and second plurality of word line plates, respectively; a plurality of spacers; a plurality of pillars coupled with the plurality of contacts; and a plurality of storage elements each comprising chalcogenide material positioned in a recess.
Public/Granted literature
- US20220302210A1 MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2022-09-22
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