Invention Grant
- Patent Title: Memory cell with low resistance top electrode contact and methods for forming the same
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Application No.: US17230640Application Date: 2021-04-14
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Publication No.: US12219882B2Publication Date: 2025-02-04
- Inventor: Hsing-Hsiang Wang , Yu-Feng Yin , Jiann-Horng Lin , Huan-Just Lin
- Applicant: Taiwan Semiconductor Manufacturing Company Limited
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee Address: TW Hsinchu
- Agency: The Marbury Law Group, PLLC
- Main IPC: H10N50/80
- IPC: H10N50/80 ; H10B61/00 ; H10N50/01

Abstract:
A magnetic tunnel junction (MTJ) memory cell comprising a connection via structure, a bottom electrode disposed on the connection via structure, a memory material stack disposed on the bottom electrode, and a conductive contact structure disposed on the memory material stack, in which a bottom surface of the conductive contact structure is in direct contact with a memory material layer of the memory material stack.
Public/Granted literature
- US20210399207A1 MEMORY CELL WITH LOW RESISTANCE TOP ELECTRODE CONTACT AND METHODS FOR FORMING THE SAME Public/Granted day:2021-12-23
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