Invention Grant
- Patent Title: Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool
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Application No.: US17244824Application Date: 2021-04-29
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Publication No.: US12224156B2Publication Date: 2025-02-11
- Inventor: Xiaopu Li , Jozef Kudela , Kallol Bera , Tsutomu Tanaka , Dmitry A. Dzilno
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01J37/32
- IPC: H01J37/32
Abstract:
Plasma source assemblies, gas distribution assemblies including the plasma source assembly and methods of generating a plasma are described. The plasma source assemblies include a powered electrode with a ground electrode adjacent a first side and a dielectric adjacent a second side. A first microwave generator is electrically coupled to the first end of the powered electrode through a first feed and a second microwave generator is electrically coupled to the second end of the powered electrode through a second feed.
Public/Granted literature
- US20210327686A1 Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer Deposition (PE-ALD) Processing Tool Public/Granted day:2021-10-21
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