Invention Grant
- Patent Title: Semiconductor manufacturing apparatus and method for manufacturing semiconductor device
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Application No.: US17518727Application Date: 2021-11-04
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Publication No.: US12224199B2Publication Date: 2025-02-11
- Inventor: Takafumi Yamamoto , Takuya Nomoto
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- Priority: JP2021-055492 20210329
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/02 ; H01L21/66

Abstract:
According to an aspect of the present disclosure, a semiconductor manufacturing apparatus includes a stage having a mounting region for a wafer on an upper surface, a plurality of sucking pipes extending from the mounting region to a back surface side of the stage through the stage, a vacuum pump that is connected to the plurality of sucking pipes and sucks the wafer onto the mounting region via the plurality of sucking pipes, a cup provided on the upper surface of the stage and covering the wafer, a gas supply line that pressurizes a space surrounded by the upper surface of the stage and the cup and a pressure sensor that detects pressure in the plurality of sucking pipes.
Public/Granted literature
- US20220310437A1 SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2022-09-29
Information query
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