Invention Grant
- Patent Title: Domain switching devices and methods of manufacturing the same
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Application No.: US18486493Application Date: 2023-10-13
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Publication No.: US12224346B2Publication Date: 2025-02-11
- Inventor: Jinseong Heo , Sangwook Kim , Yunseong Lee , Sanghyun Jo
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2019-0117483 20190924
- Main IPC: H01L29/06
- IPC: H01L29/06 ; G11C11/22 ; H01L21/28 ; H01L29/66 ; H01L29/78

Abstract:
A domain switching device includes a channel region, a source region and a drain region connected to the channel region, a gate electrode isolated from contact with the channel region, an anti-ferroelectric layer between the channel region and the gate electrode, a conductive layer between the gate electrode and the anti-ferroelectric layer to contact the anti-ferroelectric layer, and a barrier layer between the anti-ferroelectric layer and the channel region.
Public/Granted literature
- US20240038890A1 DOMAIN SWITCHING DEVICES AND METHODS OF MANUFACTURING THE SAME Public/Granted day:2024-02-01
Information query
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