Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17868900Application Date: 2022-07-20
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Publication No.: US12230328B2Publication Date: 2025-02-18
- Inventor: Hyun Seo
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2021-0164339 20211125,KR10-2022-0014634 20220204
- Main IPC: G11C16/04
- IPC: G11C16/04 ; G11C16/08 ; G11C16/10 ; H10B43/10 ; H10B43/27 ; H10B43/35 ; H10B43/40

Abstract:
A semiconductor device includes a cell area including a plurality of word lines stacked on a substrate, at least one ground select line between the plurality of word lines and substrate, and a plurality of channel structures passing through the plurality of word lines and the at least one ground select line, and a peripheral circuit area including peripheral circuits controlling the cell area. The peripheral circuits input a first ground select bias voltage to the at least one ground select line during a first program time to a program word line selected from among the plurality of word lines, and input a second ground select bias voltage having a magnitude different from the first ground select bias voltage to the at least one ground select line during a second program time, the second program voltage different from the first program voltage.
Public/Granted literature
- US20230162797A1 SEMICONDUCTOR DEVICE Public/Granted day:2023-05-25
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