Invention Grant
- Patent Title: Bonded substrate and bonded substrate manufacturing method
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Application No.: US17752937Application Date: 2022-05-25
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Publication No.: US12249547B2Publication Date: 2025-03-11
- Inventor: Takashi Ebigase , Izumi Masuda , Takeshi Kaku
- Applicant: NGK INSULATORS, LTD.
- Applicant Address: JP Nagoya
- Assignee: NGK INSULATORS, LTD.
- Current Assignee: NGK INSULATORS, LTD.
- Current Assignee Address: JP Nagoya
- Agency: MATTINGLY & MALUR, PC
- Priority: WOPCT/JP2019/047117 20191203
- Main IPC: H01L23/15
- IPC: H01L23/15 ; C04B35/584 ; H01L23/373 ; H05K1/03

Abstract:
The bonded substrate includes the silicon nitride ceramic substrate, a copper plate, the bonding layer, and penetrating regions. The copper plate and the bonding layer are patterned into a predetermined shape, and are disposed over a main surface of the silicon nitride ceramic substrate. The bonding layer bonds the copper plate to the main surface of the silicon nitride ceramic substrate. The penetrating regions each include one or more penetrating portions penetrating continuously from the main surface of the substrate into the silicon nitride ceramic substrate to a depth of 3 μm or more and 20 μm or less, and contain silver, and the number of penetrating regions present per square millimeter of the main surface of the substrate is one or more and 30 or less.
Public/Granted literature
- US20220285238A1 BONDED SUBSTRATE AND BONDED SUBSTRATE MANUFACTURING METHOD Public/Granted day:2022-09-08
Information query
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