Support device for supporting a substrate, method of processing a substrate and semiconductor substrate
Abstract:
A support device includes a substrate receiving region. The support device includes a support body shaped as a pattern having an array of openings. The support body is a sparse structure wherein a joint area of the openings of the array of openings is 40% or more of the area of the substrate receiving region. The support body includes one or more suction openings configured to be in fluid communication with a vacuum source arrangement.
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