Invention Grant
- Patent Title: Dense via pitch interconnect to increase wiring density
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Application No.: US18049143Application Date: 2022-10-24
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Publication No.: US12266598B2Publication Date: 2025-04-01
- Inventor: Francesco Preda , Sungjun Chun , Jose A. Hejase , Junyan Tang , Pavel Roy Paladhi , Nam Huu Pham , Wiren Dale Becker , Daniel Mark Dreps
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Patterson + Sheridan, LLP
- Main IPC: H05K1/02
- IPC: H05K1/02 ; H01L21/48 ; H01L23/498 ; H05K1/11 ; H05K1/18

Abstract:
An enhanced integrated circuit interconnect package, method and multiple-layer integrated circuit laminate structure enable increased routing density per layer and maintains signal integrity performance. A differential signal via pair of vertical interconnect vias provide differential signaling. The vias of the differential signal via pair are positioned closely spaced together with each via offset from a center axis of an associated LGA contact, minimizing space between the differential signal vias and maintaining signal integrity performance, and providing increased available wiring signal channel.
Public/Granted literature
- US20240234284A9 DENSE VIA PITCH INTERCONNECT TO INCREASE WIRING DENSITY Public/Granted day:2024-07-11
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