Invention Grant
- Patent Title: Top-interconnection metal lines for a memory array device and methods for forming the same
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Application No.: US18336430Application Date: 2023-06-16
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Publication No.: US12268097B2Publication Date: 2025-04-01
- Inventor: Yu-Feng Yin , Tai-Yen Peng , An-Shen Chang , Qiang Fu , Chung-Te Lin , Han-Ting Tsai
- Applicant: Taiwan Semiconductor Manufacturing Company Limited
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee Address: TW Hsinchu
- Agency: The Marbury Law Group, PLLC
- Main IPC: H10N50/10
- IPC: H10N50/10 ; H01L23/528 ; H10B61/00 ; H10N50/01 ; H10N50/80

Abstract:
A memory array device includes an array of memory cells located over a substrate, a memory-level dielectric layer laterally surrounding the array of memory cells, and top-interconnection metal lines laterally extending along a horizontal direction and contacting a respective row of top electrodes within the memory cells. Top electrodes of the memory cells are planarized to provide top surfaces that are coplanar with the top surface of the memory-level dielectric layer. The top-interconnection metal lines do not extend below the horizontal plane including the top surface of the memory-level dielectric layer, and prevent electrical shorts between the top-interconnection metal lines and components of memory cells.
Public/Granted literature
- US20230329123A1 TOP-INTERCONNECTION METAL LINES FOR A MEMORY ARRAY DEVICE AND METHODS FOR FORMING THE SAME Public/Granted day:2023-10-12
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