Invention Grant
- Patent Title: Composition for memory cell containing chalcogen compound, structure thereof, method for manufacturing same, and method for operating same
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Application No.: US17774191Application Date: 2020-11-13
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Publication No.: US12268104B2Publication Date: 2025-04-01
- Inventor: Jun-sung Kim , Seung-hwan Lee , Sang-hoon Yoon
- Applicant: IHW Inc.
- Applicant Address: KR Yongin-si
- Assignee: IHW Inc.
- Current Assignee: IHW Inc.
- Current Assignee Address: KR Yongin-si
- Agency: LEX IP MEISTER, PLLC
- International Application: PCT/KR2020/015992 WO 20201113
- International Announcement: WO2021/096288 WO 20210520
- Main IPC: H10N70/00
- IPC: H10N70/00 ; G11C13/00 ; H10B63/00 ; H10B63/10 ; H10N70/20

Abstract:
An object of the present invention is to provide a composition, a memory structure suitable for the composition, a manufacturing method, and an operating method for stable operation in a memory element including a chalcogen compound. In order to achieve the object, in a memory array with a cross-point structure including a first electrode line and a second electrode line intersecting each other, and a selective memory element disposed at each intersection of the first electrode line and the second electrode line and being a chalcogen compound, the present invention may provide the memory array with a cross-point structure including the first electrode line formed on a substrate, a first functional electrode formed between the first electrode line and the selective memory element, and a second functional electrode formed between the second electrode line and the selective memory element, wherein the first functional electrode is formed as a line along the first electrode line.
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