Invention Grant
- Patent Title: Amidinate compound, dimer compound thereof, thin-film forming raw material, and method of producing thin film
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Application No.: US17917671Application Date: 2021-03-31
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Publication No.: US12275748B2Publication Date: 2025-04-15
- Inventor: Tomoharu Yoshino , Yoshiki Ooe , Keisuke Takeda , Ryota Fukushima , Chiaki Mitsui , Atsushi Yamashita
- Applicant: ADEKA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: ADEKA CORPORATION
- Current Assignee: ADEKA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2020-070708 20200410
- International Application: PCT/JP2021/013898 WO 20210331
- International Announcement: WO2021/205958 WO 20211014
- Main IPC: C07F15/06
- IPC: C07F15/06 ; C01B33/027 ; C07F5/00 ; C07F7/02 ; C07F7/22 ; C07F13/00 ; C07F15/04 ; C23C16/18 ; C23C16/40 ; C23C16/455

Abstract:
The present invention provides an amidinate compound represented by the following general formula (1) or a dimer compound thereof, and a method of producing a thin-film including using the compound as a raw material: where R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms, R3 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M represents a metal atom or a silicon atom, and “n” represents the valence of the atom represented by M, provided that at least one hydrogen atom of R1 to R3 is substituted with a fluorine atom.
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