Embodiments of the present disclosure relate to the field of semiconductors, and provide a process recipe, a method and a system for generating same, and a semiconductor manufacturing method. The method for generating a diffraction-based process recipe includes: providing a basic process recipe, the basic process recipe is used to form an initial alignment pattern; and performing a feedback correction step for at least one time to adjust the basic process recipe and obtain an actual process recipe, which each time includes: obtaining a first pattern and a second pattern based on the basic process recipe prior to a current feedback correction step, the first pattern is the initial alignment pattern that is developed, the second pattern is the initial alignment pattern that is etched; and adjusting the basic process recipe prior to the current feedback correction step based on a difference between the first pattern and the second pattern.