Invention Grant
- Patent Title: Power distribution method
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Application No.: US18448148Application Date: 2023-08-10
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Publication No.: US12278185B2Publication Date: 2025-04-15
- Inventor: Shih-Wei Peng , Te-Hsin Chiu , Jiann-Tyng Tzeng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L23/00 ; H01L23/50 ; H01L23/538 ; H01L27/06 ; H10D88/00

Abstract:
A method of forming an integrated circuit (IC) package includes constructing a first power distribution structure on a first die included in the IC package, thereby electrically connecting the first power distribution structure to a second power distribution structure positioned on a back side of the first die, and bonding a third power distribution structure to the first power distribution structure, the third power distribution structure being positioned on a back side of a second die.
Public/Granted literature
- US20230411300A1 POWER DISTRIBUTION METHOD Public/Granted day:2023-12-21
Information query
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