Invention Grant
- Patent Title: Semiconductor device
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Application No.: US18505684Application Date: 2023-11-09
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Publication No.: US12278263B2Publication Date: 2025-04-15
- Inventor: Takeshi Suwa , Tomoko Matsudai , Yoko Iwakaji , Hiroko Itokazu
- Applicant: Kabushiki Kaisha Toshiba , Toshiba Electronic Devices & Storage Corporation
- Applicant Address: JP Tokyo; JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee: Kabushiki Kaisha Toshiba,Toshiba Electronic Devices & Storage Corporation
- Current Assignee Address: JP Tokyo; JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JP2021-039142 20210311
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/739 ; H01L29/78

Abstract:
A semiconductor device includes a semiconductor part, a first electrode and control electrodes at the front side of the semiconductor part. The semiconductor part includes first to fourth layers, first and third layers being of a first conductivity type, second and fourth layers being of a second conductivity type. The control electrodes are provided in a plurality of trenches, respectively. The control electrodes include a first control electrode, and a second control electrode next to the first control electrode. The second layer is provided between the first layer and the first electrode. The third and fourth layers are provided between the second layer and the first electrode. The semiconductor part further includes a first region partially provided between the first and second layers. The first region is provided between the first and third layers, the first region including a material having a lower thermal conductivity than the first layer.
Public/Granted literature
- US20240072111A1 SEMICONDUCTOR DEVICE Public/Granted day:2024-02-29
Information query
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