An insulated gate bipolar transistor includes a semiconductor substrate, and the semiconductor substrate includes: a collector region doped in a first type, wherein the collector region includes a bump region; a first drift region doped in a second type and a second drift region doped in the second type; wherein the first drift region and the second drift region locate on a side of the collector region having the bump region, a profile contour of the first drift region matches a profile contour of the bump region, such that the second drift region does not contact the bump region, and a doping concentration of the first drift region is greater than a doping concentration of the second drift region; and a first active region and a second active region, formed at two opposite ends of the second drift region.