Invention Grant
- Patent Title: Differentiable model for manufacturability
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Application No.: US17665860Application Date: 2022-02-07
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Publication No.: US12287614B2Publication Date: 2025-04-29
- Inventor: Raj Apte , Cyrus Behroozi , Zhigang Pan , Dino Ruic
- Applicant: X Development LLC
- Applicant Address: US CA Mountain View
- Assignee: X Development LLC
- Current Assignee: X Development LLC
- Current Assignee Address: US CA Mountain View
- Agency: Botos Churchill IP Law LLP
- Main IPC: G05B19/18
- IPC: G05B19/18 ; G05B13/02

Abstract:
Systems, computer-implemented methods, and instructions encoded in machine-accessible storage media are provided for determining manufacturability of an integrated circuit layout. A computer-implemented method includes receiving a layout describing the integrated circuit to be manufactured by a semiconductor manufacturing process. The method also includes generating a differentiable manufacturability parameter as an output of a machine learning model using the layout, the machine learning model being trained to generate the differentiable manufacturability parameter. The differentiable manufacturability parameter describes the manufacturability of the integrated circuit by the semiconductor manufacturing process.
Public/Granted literature
- US20230251620A1 DIFFERENTIABLE MODEL FOR MANUFACTURABILITY Public/Granted day:2023-08-10
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