Invention Grant
- Patent Title: Piezoelectric film acoustic resonator
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Application No.: US17566711Application Date: 2021-12-31
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Publication No.: US12289091B2Publication Date: 2025-04-29
- Inventor: Shuai Yang , Lirong Zhang , Ke Wu , Zhiqiang Zhuang , Chao Wang
- Applicant: AAC Technologies (Nanjing) Co., Ltd. , AAC ACOUSTIC TECHNOLOGIES (SHENZHEN) CO., LTD.
- Applicant Address: CN Nanjing; CN Shenzhen
- Assignee: AAC Technologies (Nanjing) Co., Ltd.,AAC ACOUSTIC TECHNOLOGIES (SHENZHEN) CO., LTD.
- Current Assignee: AAC Technologies (Nanjing) Co., Ltd.,AAC ACOUSTIC TECHNOLOGIES (SHENZHEN) CO., LTD.
- Current Assignee Address: CN Nanjing; CN Shenzhen
- Agency: Wiersch Law Group
- Priority: CN202122961003.X 20211129
- Main IPC: H03H9/02
- IPC: H03H9/02 ; H03H9/17

Abstract:
The present invention provides a piezoelectric film acoustic resonator, which comprises a substrate, a first electrode disposed over the substrate, a piezoelectric film disposed over the substrate and covering at least a portion of the first electrode and a second electrode disposed on a surface of the piezoelectric film away from the first electrode, one end of the first electrode extends in the direction away from the piezoelectric film to form a first extended pad, one end of the second electrode extends in the direction away from the first extended pad to form a second extended pad, the first extended pad comprises a first protruding reflection grating on the surface away from the substrate, the second extended pad comprises a second protruding reflection grating on the surface away from the substrate. The configuration can reduce the impact on acoustic performance while improving the quality factor.
Public/Granted literature
- US20230170874A1 PIEZOELECTRIC FILM ACOUSTIC RESONATOR Public/Granted day:2023-06-01
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