Invention Grant
- Patent Title: Method for removing an impurity from a chlorosilane mixture
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Application No.: US17778236Application Date: 2019-11-27
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Publication No.: US12291458B2Publication Date: 2025-05-06
- Inventor: Jens Felix Knoth , Sebastian Bochmann , Uwe Pätzold , Sebastian Prost
- Applicant: WACKER CHEMIE AG
- Applicant Address: DE Munich
- Assignee: WACKER CHEMIE AG
- Current Assignee: WACKER CHEMIE AG
- Current Assignee Address: DE Munich
- Agency: BROOKS KUSHMAN P.C.
- International Application: PCT/EP2019/082727 WO 20191127
- International Announcement: WO2021/104618 WO 20210603
- Main IPC: C01B33/107
- IPC: C01B33/107 ; B01J20/28 ; B01J20/285 ; C07F7/12 ; C07F7/20

Abstract:
Boron, phosphorus, arsenic, antimony and other impurities are at least partially removed from a mixture containing at least one chlorosilane and/or organochlorosilane by a) contacting the liquid mixture with a carrier material functionalized with an amidoxime of the general structural formula (I), where CAR=carrier material and R1, R2 are independently of one another H, alkyl, alkenyl, aryl, alkylaryl; and b) optionally removing the functionalized carrier material.
Public/Granted literature
- US20220411273A1 METHOD FOR REMOVING AN IMPURITY FROM A CHLOROSILANE MIXTURE Public/Granted day:2022-12-29
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