Invention Grant
- Patent Title: Imprint method, imprint apparatus, and method of manufacturing article
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Application No.: US17949296Application Date: 2022-09-21
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Publication No.: US12292681B2Publication Date: 2025-05-06
- Inventor: Naosuke Nishimura
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: ROSSI, KIMMS & McDOWELL LLP
- Priority: JP2021-158395 20210928
- Main IPC: G03F7/00
- IPC: G03F7/00

Abstract:
The present invention provides an imprint method of forming, using a mold, a pattern of an imprint material on a substrate having a dimension smaller than a dimension of a holding surface of a substrate stage, comprising: causing the holding surface to hold a plate; causing the plate to support the substrate, by causing the holding surface to hold the substrate by via the plate; bringing the mold into contact with the imprint material on the substrate; curing the imprint material on the substrate; and separating the mold from the cured imprint material, wherein holding of the plate by the substrate stage is controlled while maintaining supporting of the substrate by the plate, such that the substrate is deformed into a convex shape together with the plate upon in the separating.
Public/Granted literature
- US20230097588A1 IMPRINT METHOD, IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE Public/Granted day:2023-03-30
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