Invention Grant
- Patent Title: Integrated circuit stack verification method and system for performing the same
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Application No.: US18323593Application Date: 2023-05-25
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Publication No.: US12293141B2Publication Date: 2025-05-06
- Inventor: Feng Wei Kuo , Shuo-Mao Chen , Chin-Yuan Huang , Kai-Yun Lin , Ho-Hsiang Chen , Chewn-Pu Jou
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: G06F30/398
- IPC: G06F30/398 ; H01L23/544 ; H01L25/07

Abstract:
A method of verifying an integrated circuit stack includes adding a first dummy layer to a first contact pad of a circuit, wherein a location of the first dummy layer is determined based on a location of a second contact pad of a connecting substrate. The method further includes converting the first dummy layer location to the connecting substrate. The method further includes adjusting the first dummy layer location in the circuit in response to a determination that the first dummy layer location is misaligned with the second contact pad. The method further includes performing a first layout versus schematic (LVS) check of the connecting substrate including the first dummy layer in response to a determination that the first dummy layer is aligned with the second contact pad.
Public/Granted literature
- US20230297759A1 INTEGRATED CIRCUIT STACK VERIFICATION METHOD AND SYSTEM FOR PERFORMING THE SAME Public/Granted day:2023-09-21
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