Invention Grant
- Patent Title: Memory device
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Application No.: US17690650Application Date: 2022-03-09
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Publication No.: US12302588B2Publication Date: 2025-05-13
- Inventor: Meng-Han Lin , Chia-En Huang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H10B53/20 ; H10B61/00 ; H10B63/00

Abstract:
A memory device includes two word-line electrodes, two source-line electrodes, and two data storage features for use by four memory cells, which are referred to as first, second, third and fourth memory cells. One word-line electrode is common to the first and second memory cells, and the other word-line electrode is common to the third and fourth memory cells. One source-line electrode is common to the first and second memory cells, and the other source-line electrode is common to the third and fourth memory cells. One data storage feature is common to the first and third memory cells, and the other data storage feature is common to the second and fourth memory cells.
Public/Granted literature
- US20230292531A1 MEMORY DEVICE Public/Granted day:2023-09-14
Information query
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