Invention Grant
- Patent Title: Planar high-electron-mobility transistor
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Application No.: US17517425Application Date: 2021-11-02
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Publication No.: US12302597B2Publication Date: 2025-05-13
- Inventor: Xiang Zhou
- Applicant: Nantong Sanrise Integrated Circuit Co., LTD
- Applicant Address: CN Jiangsu
- Assignee: Nantong Sanrise Integrated Circuit Co., LTD
- Current Assignee: Nantong Sanrise Integrated Circuit Co., LTD
- Current Assignee Address: CN Jiangsu
- Agency: Banner & Witcoff, Ltd.
- Priority: CN202011536169.0 20201223
- Main IPC: H10D30/47
- IPC: H10D30/47 ; H10D62/824 ; H10D62/85 ; H10D64/23 ; H10D64/27

Abstract:
The present application discloses a planar High-Electron-Mobility Transistor (HEMT), which includes a hetero-junction consisting of a first semiconductor epitaxial layer and a second semiconductor epitaxial layer, and two-dimensional electron gas located at an interface of the hetero-junction; a bottom surface of a gate trench of a trench gate is located at a bottom of the two-dimensional electron gas to cut off the two-dimensional electron gas; when gate-source voltage is higher than or equal to threshold voltage, an inversion layer is formed on a surface of the first semiconductor epitaxial layer covered by side surfaces and a bottom surface of a gate conductive material layer, and the source-end and drain-end two-dimensional electron gas is conducted to enable the device to be on; when the gate-source voltage is lower than the threshold voltage, the source-end and drain-end two-dimensional electron gas is cut off to enable the device to be off.
Public/Granted literature
- US20220199814A1 Planar High-Electron-Mobility Transistor Public/Granted day:2022-06-23
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