Invention Grant
- Patent Title: Semiconductor material and semiconductor device
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Application No.: US16964115Application Date: 2019-01-17
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Publication No.: US12317600B2Publication Date: 2025-05-27
- Inventor: Hitoshi Kunitake , Shuhei Nagatsuka
- Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Applicant Address: JP Atsugi
- Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Current Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Current Assignee Address: JP Atsugi
- Agency: Fish & Richardson P.C.
- Priority: JP2018-010564 20180125
- International Application: PCT/IB2019/050375 WO 20190117
- International Announcement: WO2019/145827 WO 20190801
- Main IPC: H10D87/00
- IPC: H10D87/00 ; H10D86/80

Abstract:
A semiconductor device in which an electrification phenomenon that leads to characteristic fluctuations, element deterioration, or dielectric breakdown is inhibited is provided. A first transistor, a second transistor, a third transistor, and a fourth transistor are included over a substrate; the fourth transistor includes a first conductor, a second conductor, a third conductor, and an oxide semiconductor; the first conductor is electrically connected to the semiconductor substrate through the first transistor; the second conductor is electrically connected to the semiconductor substrate through the first transistor; the third conductor is electrically connected to the semiconductor substrate through the first transistor; and the fourth conductor is electrically connected to the semiconductor substrate through the first transistor.
Public/Granted literature
- US20210036025A1 SEMICONDUCTOR MATERIAL AND SEMICONDUCTOR DEVICE Public/Granted day:2021-02-04
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