Invention Grant
- Patent Title: Semiconductor manufacturing device and method of using the same
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Application No.: US17688103Application Date: 2022-03-07
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Publication No.: US12322611B2Publication Date: 2025-06-03
- Inventor: Keiji Nakagawa
- Applicant: KABUSHIKI KAISHA TOSHIBA , TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
- Applicant Address: JP Tokyo; JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA,TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
- Current Assignee: KABUSHIKI KAISHA TOSHIBA,TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
- Current Assignee Address: JP Tokyo; JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JP2021-154480 20210922
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/683 ; H01L21/78

Abstract:
A semiconductor manufacturing device includes a table having an upper face on which a frame having a first opening to which a substrate is fixed by an adhesive is disposed, the table having a plurality of first through holes penetrating the table in a vertical direction and provided side by side in a first direction parallel to the upper face and a plurality of second through holes each provided between the adjacent first through holes and penetrating the table in the vertical direction; and a container provided on the table, the container including a first sidewall provided on the frame, a second sidewall provided on the frame, the second sidewall facing the first sidewall, a distance between the second sidewall and the first sidewall being larger than a first inner diameter of the first opening, and a joint allowing an outside of the container and an inside of the container to communicate with each other.
Public/Granted literature
- US20230093400A1 SEMICONDUCTOR MANUFACTURING DEVICE AND METHOD OF USING THE SAME Public/Granted day:2023-03-23
Information query
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