Invention Grant
- Patent Title: Methods of writing and forming memory device
-
Application No.: US18601994Application Date: 2024-03-11
-
Publication No.: US12324165B2Publication Date: 2025-06-03
- Inventor: Chien-Min Lee , Ming-Yuan Song , Yen-Lin Huang , Shy-Jay Lin , Tung-Ying Lee , Xinyu Bao
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: G11C11/18
- IPC: G11C11/18 ; G11C11/16 ; H10B61/00 ; H10N52/00 ; H10N52/01 ; H10N52/80

Abstract:
Provided are a memory device and a method of forming the same. The memory device includes: a selector; a magnetic tunnel junction (MTJ) structure, disposed on the selector; a spin orbit torque (SOT) layer, disposed between the selector and the MTJ structure, wherein the SOT layer has a sidewall aligned with a sidewall of the selector; a transistor, wherein the transistor has a drain electrically coupled to the MTJ structure; a word line, electrically coupled to a gate of the transistor; a bit line, electrically coupled to the SOT layer; a first source line, electrically coupled to a source of the transistor; and a second source line, electrically coupled to the selector, wherein the transistor is configured to control a write signal flowing between the bit line and the second source line, and control a read signal flowing between the bit line and the first source line.
Public/Granted literature
- US20240215262A1 METHODS OF WRITING AND FORMING MEMORY DEVICE Public/Granted day:2024-06-27
Information query