Invention Grant
- Patent Title: Lateral fin static induction transistor
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Application No.: US18623766Application Date: 2024-04-01
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Publication No.: US12324178B2Publication Date: 2025-06-03
- Inventor: Biqin Huang
- Applicant: HRL Laboratories, LLC
- Applicant Address: US CA Malibu
- Assignee: HRL Laboratories, LLC
- Current Assignee: HRL Laboratories, LLC
- Current Assignee Address: US CA Malibu
- Agency: Ladas & Parry, LLP
- Main IPC: H10D62/83
- IPC: H10D62/83 ; H01L21/761 ; H10D12/01 ; H10D30/00 ; H10D30/01 ; H10D30/87 ; H10D62/10 ; H10D62/13 ; H10D62/17 ; H10D62/822 ; H10D62/832 ; H10D62/834 ; H10D30/62

Abstract:
Presented is a lateral fin static induction transistor including a semi conductive substrate, source and drain regions extending from an optional buffer layer of same or varied thickness supported by the semi conductive substrate, a semi conductive channel electrically coupling the source region to the drain region of the transistor, a portion of the semi conductive channel being a fin and having a face covered by a gated structure, thereby defining a gated channel within the semi conductive channel, the semi conductive channel further including a drift region electrically coupling the gated channel to the drain region of the transistor.
Public/Granted literature
- US20240250160A1 LATERAL FIN STATIC INDUCTION TRANSISTOR Public/Granted day:2024-07-25
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