Invention Grant
- Patent Title: Nitride semiconductor ultraviolet light-emitting element
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Application No.: US17926269Application Date: 2020-06-24
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Publication No.: US12324279B2Publication Date: 2025-06-03
- Inventor: Akira Hirano , Yosuke Nagasawa
- Applicant: NIKKISO CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: NIKKISO CO., LTD.
- Current Assignee: NIKKISO CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Andrew L. Dunlap
- International Application: PCT/JP2020/024827 WO 20200624
- International Announcement: WO2021/260849 WO 20211230
- Main IPC: H01L33/32
- IPC: H01L33/32 ; H01L33/00 ; H10H20/01 ; H10H20/812 ; H10H20/818 ; H10H20/825

Abstract:
A nitride semiconductor ultraviolet light-emitting element is provided. The element includes a light-emitting element structure part with an n-type layer, an active layer, and a p-type layer stacked vertically, which are made of AlGaN-based semiconductors with wurtzite structure. The n-type layer has an n-type AlGaN-based semiconductor, the active layer has well layers including an AlGaN based semiconductor, and the p-type layer has a p-type AlGaN-based semiconductor. Each semiconductor layer in the n-type and the active layers is an epitaxially grown layer having a surface on which multi-step terraces parallel to the (0001) plane are formed. The n-type layer has first Ga-rich regions which include n-type AlGaN regions in which an AlGaN composition ratio is an integer ratio of Al1Ga1N2. The well layer includes a second Ga-rich region, which includes an AlGaN region in which an AlGaN composition ratio is an integer ratio of Al1Ga2N3.
Public/Granted literature
- US20230207731A1 NITRIDE SEMICONDUCTOR ULTRAVIOLET LIGHT-EMITTING ELEMENT Public/Granted day:2023-06-29
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