Invention Grant
- Patent Title: Pellicle for extreme ultraviolet lithography containing molybdenum carbide
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Application No.: US17698427Application Date: 2022-03-18
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Publication No.: US12326658B2Publication Date: 2025-06-10
- Inventor: Hyeong Keun Kim , Seul Gi Kim , Hyun Mi Kim , Jin Woo Cho , Yong Kyung Kim
- Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTE
- Applicant Address: KR Seongnam-si
- Assignee: KOREA ELECTRONICS TECHNOLOGY INSTITUTE
- Current Assignee: KOREA ELECTRONICS TECHNOLOGY INSTITUTE
- Current Assignee Address: KR Seongnam-si
- Agency: Knobbes, Martens, Olson & Bear, LLP
- Priority: KR10-2021-0046187 20210409
- Main IPC: G03F1/62
- IPC: G03F1/62
Abstract:
A pellicle for extreme ultraviolet lithography containing molybdenum carbide is disclosed. The pellicle includes a substrate having an opening formed in a central portion, and a pellicle layer formed on the substrate to cover the opening and including a molybdenum carbide containing layer that contains molybdenum carbide expressed as MoC1-x (0
Public/Granted literature
- US20220326603A1 PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRAPHY CONTAINING MOLYBDENUM CARBIDE Public/Granted day:2022-10-13
Information query
