Invention Grant
- Patent Title: Semiconductor processing apparatus and method
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Application No.: US17520052Application Date: 2021-11-05
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Publication No.: US12327748B2Publication Date: 2025-06-10
- Inventor: Zhuo Wang , Saiqian Zhang
- Applicant: Piotech Inc.
- Applicant Address: CN Shenyang
- Assignee: Piotech Inc.
- Current Assignee: Piotech Inc.
- Current Assignee Address: CN Shenyang
- Agency: Blank Rome LLP
- Priority: CN202011642968.6 20201231
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01J37/32

Abstract:
This application relates to a semiconductor processing apparatus and method. In an embodiment of this application, the semiconductor processing apparatus includes: a wafer pocket provided with a lower electrode, where the lower electrode is coupled to a direct-current power supply; and an upper electrode disposed opposite to the wafer pocket, where the upper electrode is coupled to a radio frequency generator through a matching circuit, and is grounded through a low-pass filter.
Public/Granted literature
- US20220208590A1 SEMICONDUCTOR PROCESSING APPARATUS AND METHOD Public/Granted day:2022-06-30
Information query
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