Invention Grant
- Patent Title: Filter device and plasma processing apparatus
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Application No.: US17963735Application Date: 2022-10-11
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Publication No.: US12334309B2Publication Date: 2025-06-17
- Inventor: Naohiko Okunishi , Nozomu Nagashima
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: XSENSUS LLP
- Priority: KE2017-086492 20170425
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/458 ; H01L21/67 ; H01L21/683 ; H01L21/687

Abstract:
Provided is a filter device includes: a first coil group including a plurality of coils arranged along a central axis and spirally wound with a first inner diameter; and a second coil group including a plurality of coils arranged along the central axis and spirally wound with a second inner diameter larger than the first inner diameter. A pitch between respective turns of the plurality of coils of the second coil group is larger than a pitch between respective turns of the plurality of coils of the first coil group.
Public/Granted literature
- US20230031368A1 FILTER DEVICE AND PLASMA PROCESSING APPARATUS Public/Granted day:2023-02-02
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