Invention Grant
- Patent Title: Method for manufacturing a SiC electronic device with reduced handling steps, and sic electronic device
-
Application No.: US18459273Application Date: 2023-08-31
-
Publication No.: US12334346B2Publication Date: 2025-06-17
- Inventor: Simone Rascuna' , Paolo Badala' , Anna Bassi , Mario Giuseppe Saggio , Giovanni Franco
- Applicant: STMicroelectronics S.r.l.
- Applicant Address: IT Agrate Brianza
- Assignee: STMicroelectronics S.r.l.
- Current Assignee: STMicroelectronics S.r.l.
- Current Assignee Address: IT Agrate Brianza
- Agency: Seed IP Law Group LLP
- Priority: IT102020000004696 20200305
- Main IPC: H01L21/04
- IPC: H01L21/04 ; H10D62/832 ; H10D64/62 ; H10D64/64

Abstract:
A method for manufacturing an electronic device based on SiC includes forming a structural layer of SiC on a front side of a substrate. The substrate has a back side that is opposite to the front side along a direction. Active regions of the electronic device are formed in the structure layer, and the active regions are configured to generate or conduct electric current during the use of the electronic device. A first electric terminal is formed on the structure layer, and an intermediate layer is formed at the back side of the substrate. The intermediate layer is heated by a LASER beam in order to generate local heating such as to favor the formation of an ohmic contact of Titanium compounds. A second electric terminal of the electronic device is formed on the intermediate layer.
Public/Granted literature
- US20230411158A1 METHOD FOR MANUFACTURING A SIC ELECTRONIC DEVICE WITH REDUCED HANDLING STEPS, AND SIC ELECTRONIC DEVICE Public/Granted day:2023-12-21
Information query
IPC分类: