Invention Grant
- Patent Title: Pressure control device
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Application No.: US17785352Application Date: 2020-12-03
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Publication No.: US12334355B2Publication Date: 2025-06-17
- Inventor: Kaoru Hirata , Kouji Nishino , Katsuyuki Sugita , Shinya Ogawa , Keisuke Ideguchi
- Applicant: FUJIKIN INCORPORATED
- Applicant Address: JP Osaka
- Assignee: FUJIKIN INCORPORATED
- Current Assignee: FUJIKIN INCORPORATED
- Current Assignee Address: JP Osaka
- Agency: Studebaker Brackett PLLC
- Priority: JP2019-235252 20191225
- International Application: PCT/JP2020/045060 WO 20201203
- International Announcement: WO2021/131577 WO 20210701
- Main IPC: G01F1/34
- IPC: G01F1/34 ; G05D16/20 ; H01L21/3065 ; H01L21/66 ; G01F1/48

Abstract:
A pressure control device includes a pressure control valve, a flow resistance provided downstream of the pressure control valve, a first pressure sensor for measuring a gas pressure between the pressure control valve and the flow resistance, a second pressure sensor for measuring a gas pressure downstream of the flow resistance, and a calculation control circuit connected to the first pressure sensor and the second pressure sensor, wherein the pressure control device controls the gas pressure downstream of the flow resistance by adjusting an opening degree of the pressure control valve based on an output of the second pressure sensor regardless of an output of the first pressure sensor control, and calculates the flow rate of the gas downstream of the flow resistance, based on the outputs of the first and the second pressure sensors.
Public/Granted literature
- US20230011244A1 PRESSURE CONTROL DEVICE Public/Granted day:2023-01-12
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