Invention Grant
- Patent Title: Abnormality detecting apparatus, semiconductor manufacturing apparatus, and abnormality detecting method
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Application No.: US17354158Application Date: 2021-06-22
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Publication No.: US12334374B2Publication Date: 2025-06-17
- Inventor: Yuka Nakasato
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Venjuris, P.C.
- Priority: JP2020-113510 20200630
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G05B23/02
Abstract:
An abnormality detecting apparatus detects an abnormality of a semiconductor manufacturing apparatus, and includes: a data generator configured to generate correlation data based on a value of a first monitoring target and a value of a second monitoring target that are correlated with each other; a calculator configured to calculate a slop of a regression line of the correlation data based on the correlation data; and an abnormality determination device configured to determine an abnormality of the semiconductor manufacturing apparatus based on the slope of the regression line.
Public/Granted literature
- US20210407835A1 ABNORMALITY DETECTING APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS, AND ABNORMALITY DETECTING METHOD Public/Granted day:2021-12-30
Information query
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