Invention Grant
- Patent Title: Semiconductor storage device and method for manufacturing semiconductor storage device
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Application No.: US17679866Application Date: 2022-02-24
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Publication No.: US12334437B2Publication Date: 2025-06-17
- Inventor: Takahiro Kotou
- Applicant: KIOXIA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: KIOXIA CORPORATION
- Current Assignee: KIOXIA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Kim & Stewart LLP
- Priority: JP2021-146467 20210908
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H10B43/27

Abstract:
A semiconductor storage device includes a plurality of wiring layers stacked in a first direction, a memory pillar penetrating the plurality of wiring layers in the first direction, and a semiconductor layer provided in the memory pillar and extending in the first direction. The semiconductor storage device further includes a wiring layer that extends in a second direction crossing the first direction, is provided above the plurality of wiring layers, and penetrates the semiconductor layer.
Public/Granted literature
- US20230071758A1 SEMICONDUCTOR STORAGE DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2023-03-09
Information query
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