Invention Grant
- Patent Title: Nonvolatile memory device
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Application No.: US17860618Application Date: 2022-07-08
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Publication No.: US12336178B2Publication Date: 2025-06-17
- Inventor: Kyunghwa Yun , Chanho Kim , Dongku Kang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2019-0128221 20191016
- Main IPC: H10B43/27
- IPC: H10B43/27 ; H10B41/10 ; H10B41/27 ; H10B41/40 ; H10B43/10 ; H10B43/40

Abstract:
A nonvolatile memory device includes a peripheral circuit including a first active region and a memory block including a second active region on the peripheral circuit. The memory block includes a vertical structure including pairs of a first insulating layer and a first conductive layer, a second insulating layer on the vertical structure, a second conductive layer and a third conductive layer spaced apart from each other on the second insulating layer, first vertical channels and second vertical channels. The second conductive layer and the third conductive layer are connected with a first through via penetrating the vertical structure, the second active region, and a region of the second insulating layer that is exposed between the second conductive layer and the third conductive layer.
Public/Granted literature
- US20220352204A1 NONVOLATILE MEMORY DEVICE Public/Granted day:2022-11-03
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