- Patent Title: Electrostatic edge ring mounting system for substrate processing
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Application No.: US17796740Application Date: 2021-02-03
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Publication No.: US12340989B2Publication Date: 2025-06-24
- Inventor: Alexander Matyushkin , Keith Comendant , Adam Christopher Mace , Darrell Ehrlich , John Holland , Felix Leib Kozakevich , Alexei Marakhtanov
- Applicant: LAM RESEARCH CORPORATION
- Applicant Address: US CA Fremont
- Assignee: LAM RESEARCH CORPORATION
- Current Assignee: LAM RESEARCH CORPORATION
- Current Assignee Address: US CA Fremont
- International Application: PCT/US2021/016340 WO 20210203
- International Announcement: WO2021/158612 WO 20210812
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/687
Abstract:
An edge ring system comprising a substrate support configured to support a substrate during plasma processing and including a baseplate and an upper layer arranged on the baseplate. An edge ring support includes a first body and an electrostatic clamping electrode arranged in the first body. The edge ring support is arranged above the baseplate and radially outside of the substrate during processing. An edge ring includes a second body arranged on and electrostatically clamped to the edge ring support during plasma processing.
Public/Granted literature
- US20230075462A1 ELECTROSTATIC EDGE RING MOUNTING SYSTEM FOR SUBSTRATE PROCESSING Public/Granted day:2023-03-09
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